Integrated ultralong time constant time measurement device and fabrication process
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United States of America Patent
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Aug 8, 2023
Grant Date -
May 20, 2021
app pub date -
Jan 27, 2021
filing date -
Aug 31, 2018
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Abstract
An ultralong time constant time measurement device includes elementary capacitive elements that are connected in series. Each elementary capacitive element is formed by a stack of a first conductive region, a dielectric layer having a thickness suited for allowing charge to flow by direct tunnelling effect, and a second conductive region. The first conductive region is housed in a trench extending from a front face of a semiconductor substrate down into the semiconductor substrate. The dielectric layer rests on the first face of the semiconductor substrate and in particular on a portion of the first conductive region in the trench. The second conductive region rests on the dielectric layer.
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