Information processing apparatus, determination method, imprint apparatus, lithography system, article manufacturing method, and non-transitory computer-readable storage medium
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United States of America Patent
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Aug 8, 2023
Grant Date -
Apr 1, 2021
app pub date -
Sep 17, 2020
filing date -
Sep 30, 2019
priority date (Note) -
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Abstract
The present invention provides an information processing apparatus for determining, for a substrate having undergone an imprint process that forms a pattern of an imprint material, presence/absence of a formation defect of the pattern, including a generating unit configured to generate learning models in one-to-one correspondence with a plurality of different illumination conditions by using images obtained by capturing images of a plurality of substrates on which the pattern is formed under the plurality of illumination conditions, and an obtaining unit configured to input the images obtained by capturing images of the substrates having undergone the imprint process and containing the pattern, to a plurality of learning models generated by the generating unit, and obtain a temporary determination result temporarily indicating the presence/absence of a formation defect of the pattern from each of the plurality of learning models.
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