DC magnetron sputtering

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United States of America Patent

PATENT NO 11718908
APP PUB NO 20210246545A1
SERIAL NO

17241237

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Abstract

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A method of depositing a film on a substrate is provided. The method includes positioning the substrate on a substrate support in a chamber and depositing the film on the substrate using a DC magnetron sputtering process in which an electrical bias signal causes ions to bombard the substrate. The substrate support includes a central region surrounded by an edge region, the central region being raised with respect to the edge region, and the substrate is positioned on the central region so that a portion of the substrate overlays the edge region and is spaced apart therefrom.

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Patent Owner(s)

Patent OwnerAddress
SPTS TECHNOLOGIES LIMITEDNEWPORT

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Burgess, Steve Newport, GB 17 10
Haymore, Scott Newport, GB 15 13
Hyndman, Rhonda Newport, GB 13 16
Moncrieff, Ian Wotton-Under-Edge, GB 12 45
Rastogi, Amit Newport, GB 8 16

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