Measurement method, measurement device, measurement system, and measurement program

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United States of America Patent

PATENT NO 11714021
SERIAL NO

17204064

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Abstract

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A measurement method includes: a step of acquiring first observation point information including a time point when each part of an m-th moving object passes a first observation point and a physical quantity which is a response to an action; a step of acquiring second observation point information including a time point when the each part passes a second observation point and a physical quantity which is a response to an action; a step of calculating a deflection waveform of a structure generated by the each part; a step of adding the deflection waveforms to calculate an m-th moving object deflection waveform; a step of calculating a displacement waveform at the third observation point; and a step of calculating first to M-th amplitude coefficients by assuming that a waveform obtained by multiplying an m-th amplitude coefficient by the m-th moving object deflection waveform is an m-th amplitude adjusted deflection waveform, and that a sum of first to M-th amplitude adjusted deflection waveforms is approximated to the displacement waveform.

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Patent Owner(s)

Patent OwnerAddress
SEIKO EPSON CORPORATION1-6 SHINJUKU 4-CHOME SHINJUKU-KU TOKYO 160-8801

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kobayashi, Yoshihiro Komagane, JP 153 1041

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