Method of lithography process using reticle container with discharging device

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United States of America Patent

PATENT NO 11703763
APP PUB NO 20220260901A1
SERIAL NO

17733616

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Abstract

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A reticle, a reticle container and a method of lithography process are provided. The reticle container includes: a cover configured to protect a reticle, a baseplate, and a discharging device on the baseplate. The baseplate has: a top surface configured to engage to the cover and a bottom surface opposite to the top surface. The discharging device is configured to neutralize static charges accumulated on the reticle.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Hsiao-Lun Tainan, TW 15 18
Chen, Li-Jui Hsinchu, TW 306 606
Cheng, Po-Chung Zhongpu Township, Chiayi County, TW 162 297
Fu, Tzung-Chi Miaoli, TW 70 299
Hsu, Che-Chang Taichung, TW 25 22
Kuo, Chueh-Chi Kaohsiung, TW 25 8
Lee, Tsung-Yen Jhudong Township, Hsinchu County, TW 41 177

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