Batch-type substrate processing apparatus and operation method thereof
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United States of America Patent
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Jul 18, 2023
Grant Date -
Jan 21, 2021
app pub date -
Jun 22, 2020
filing date -
Jul 16, 2019
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Abstract
Provided is a batch-type substrate processing apparatus. The substrate processing apparatus includes a vertical reaction tube having an internal space for receiving a substrate boat in which a substrate is stacked in multiple stages, a deposition gas supply unit configured to supply a deposition gas inside the reaction tube, a heater disposed outside the reaction tube to provide a thermal energy inside the reaction tube, and an adhesion layer coated on an inner wall of the reaction tube and to which a deposition by-product layer by an excess deposition gas is attached.
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