Particle removing assembly and method of cleaning mask for lithography

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11698592
APP PUB NO 20220252993A1
SERIAL NO

17713012

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Abstract

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An photolithographic apparatus includes a particle removing cassette selectively extendable from the processing apparatus. The particle removing cassette includes a wind blade slit and an exhausting slit. The wind blade slit is configured to direct pressurized cleaning material to a surface of the mask to remove the debris particles from the surface of the mask. The exhausting slit collects the debris particles separated from the surface of the mask and contaminants through the exhaust line. In some embodiments, the wind blade slit includes an array of wind blade nozzles spaced apart within the wind blade slit. In some embodiments, the exhausting slit includes array of exhaust lines spaced apart within the exhausting slit.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTDNO 8 LI-HSIN ROAD 6 HSINCHU SCIENCE PARK HSINCHU 300

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Chia-Jen Jhudong Township, TW 98 1413
Lee, Hsin-Chang Zhubei, TW 203 1090
Lin, Chen-Yang Zhudong Township, TW 17 187
Lin, Kuan-Wen Taichung, TW 23 45
Wang, Li-Hsin Taipei, TW 5 7
Yu, Da-Wei Hsinchu, TW 5 4

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