Reducing speckle in an excimer light source
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United States of America Patent
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Jun 27, 2023
Grant Date -
Aug 5, 2021
app pub date -
Apr 26, 2021
filing date -
Jan 16, 2017
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Abstract
A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
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