Method for fabricating a crystalline metal-phosphide hetero-layer by converting first and second crystalline metal-source layers into first and second crystalline metal phosphide layers
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United States of America Patent
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Jun 13, 2023
Grant Date -
Nov 19, 2020
app pub date -
May 14, 2019
filing date -
May 14, 2019
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Abstract
Fabricating a crystalline metal-phosphide layer may include providing a crystalline base substrate and a step of forming a crystalline metal-source layer. The method may further include performing a chemical conversion reaction to convert the metal-source layer to the crystalline metal phosphide layer. One or more corresponding semiconductor structures can be also provided.
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