Mask and method of forming the same
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 30, 2023
Grant Date -
N/A
app pub date -
Nov 23, 2020
filing date -
May 30, 2018
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A mask includes a substrate, a reflective multilayer, an absorption layer and an absorption part. The substrate includes a mask image region and a mask frame region, wherein the mask frame region has a mask black border region adjacent to the mask image region. The reflective multilayer is disposed over the substrate. The absorption layer is disposed over the reflective multilayer. The absorption part is disposed in the reflective multilayer and the absorption layer and in the mask black border region, wherein an entire top surface of the absorption part is substantially flush with a top surface of the absorption layer.
First Claim
Other Claims data not available
Family
International Classification(s)
- 2020 Application Filing Year
- H01L Class
- 29783 Applications Filed
- 21134 Patents Issued To-Date
- 70.96 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 1 Citation Count
- H01L Class
- 79.89 % this patent is cited more than
- 2 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 3.5 Year Payment | $1600.00 | $800.00 | $400.00 | Nov 30, 2026 |
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Nov 30, 2030 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Nov 30, 2034 |