Low-reflection film-coated transparent substrate, photoelectric conversion device, coating liquid for forming low-reflection film of low-reflection film-coated transparent substrate, and method for producing low-reflection film-coated transparent substrate

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United States of America Patent

PATENT NO 11661519
SERIAL NO

16608602

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Abstract

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A low-reflection film-coated transparent substrate of the present invention includes a transparent substrate and a low-reflection film formed on at least one principal surface of the transparent substrate. The low-reflection film is a porous film including: fine silica particles being solid and spherical and having an average particle diameter of 80 to 150 nm; and a binder containing silica as a main component, the fine silica particles being bound by the binder. The binder further contains an aluminum compound. The low-reflection film contains as components: 55 to 70 mass % of the fine silica particles; 25 to 40 mass % of the silica of the binder; 0.1 to 1.5 mass % of the aluminum compound in terms of Al2O3; and 0.25 to 3% of an organic component. The low-reflection film has a thickness of 80 to 800 nm. A transmittance gain is 2.5% or more, the transmittance gain being defined as an increase of average transmittance of the low-reflection film-coated transparent substrate in a wavelength range of 380 to 850 nm relative to average transmittance of the transparent substrate uncoated with the low-reflection film in the wavelength range. The organic component includes at least one selected from the group consisting of a ß-ketoester and a ß-diketone.

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Patent Owner(s)

Patent OwnerAddress
NIPPON SHEET GLASS COMPANY LIMITED5-27 MITA 3-CHOME MINATO-KU TOKYO 108-6321

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kawazu, Mitsuhiro Hyogo, JP 35 293
Koyo, Mizuho Hyogo, JP 9 24
Nakazawa, Tatsuhiro Hyogo, JP 27 158

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