Raw material for forming thin film by atomic layer deposition method, method of producing thin film, and alkoxide compound

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United States of America Patent

PATENT NO 11623935
SERIAL NO

17312637

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Abstract

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Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including an alkoxide compound represented by the following general formula (1):

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Patent Owner(s)

Patent OwnerAddress
ADEKA CORPORATIONTOKYO 116-8554

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hatase, Masako Tokyo, JP 25 15
Nishida, Akihiro Tokyo, JP 58 349
Sakurai, Atsushi Tokyo, JP 209 1709
Yamashita, Atsushi Tokyo, JP 135 3148
Yoshino, Tomoharu Tokyo, JP 37 44

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