Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

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United States of America Patent

PATENT NO 11604412
APP PUB NO 20200124963A1
SERIAL NO

16722026

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Abstract

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An actinic ray-sensitive or radiation-sensitive resin composition includes a resin having a group represented by General Formula (1) and a compound that generates an acid upon irradiation with actinic rays or radiation.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM CORPORATION26-30 NISHIAZABU 2-CHOME MINATO-KU TOKYO 1068620 ?1068620

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ito, Junichi Shizuoka, JP 211 3416
Kaneko, Akihiro Shizuoka, JP 53 144
Kawashima, Takashi Shizuoka, JP 165 1524
Ogawa, Michihiro Shizuoka, JP 19 27
Tsuchimura, Tomotaka Shizuoka, JP 104 647

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