Method of manufacturing photo masks

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11592751
APP PUB NO 20210356872A1
SERIAL NO

17391311

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Abstract

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In a method of manufacturing a photo mask used in a semiconductor manufacturing process, a mask pattern layout in which a plurality of patterns are arranged is acquired. The plurality of patterns are converted into a graph having nodes and links. It is determined whether the nodes are colorable by N colors without causing adjacent nodes connected by a link to be colored by a same color, where N is an integer equal to or more than 3. When it is determined that the nodes are colorable by N colors, the nodes are colored with the N colors. The plurality of patterns are classified into N groups based on the N colored nodes. The N groups are assigned to N photo masks. N data sets for the N photo masks are output.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTDNO 8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hsieh, Ken-Hsien Taipei, TW 113 1847
Liu, Ru-Gun Zhubei, TW 404 6961
Su, Wei-Shuo Hsinchu, TW 15 26

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