Rotary charge stripping film in charge stripping device of ion beam and charge stripping method of ion beam

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United States of America Patent

PATENT NO 11581105
APP PUB NO 20190237212A1
SERIAL NO

16320340

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An object of the present invention is to provide a charge stripping film in a charge stripping device of an ion beam, which has high heat resistance and no toxicity, with which there is no risk of activation, with which an ion beam can be made multivalent even if the charge stripping film is thin, and which is resistant to high-energy beam radiation over an extended period of time. The present invention comprises a charge stripping film used in a device which strips a charge of an ion beam, wherein the charge stripping film is a rotary charge stripping film comprising a carbon film having a thermal conductivity of 20 W/mK or more in a film surface direction at 25° C., and a film thickness of the carbon film is more than 3 μm and less than 10 μm. The present invention also comprises a charge stripping film used in a device which strips a charge of an ion beam, wherein the charge stripping film is a rotary charge stripping film comprising a carbon film produced by a polymer annealing method, and a film thickness of the carbon film is more than 3 μm and less than 10 μm.

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Patent Owner(s)

Patent OwnerAddress
KANEKA CORPORATIONOSAKA JAPAN
RIKEN2-1 HIROSAWA WAKO-SHI SAITAMA 351-0198

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hasebe, Hiroo Saitama, JP 3 4
Murakami, Mutsuaki Osaka, JP 88 993
Tachibana, Masamitsu Osaka, JP 25 121
Tatami, Atsushi Osaka, JP 18 70

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