Substrate treatment method and substrate treatment apparatus
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United States of America Patent
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Feb 7, 2023
Grant Date -
Oct 29, 2020
app pub date -
Apr 10, 2020
filing date -
Apr 23, 2019
priority date (Note) -
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status (Latency Note)
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Abstract
A substrate treatment method for treating a substrate, includes: (a) applying a coating solution to a front surface of the substrate by a spin coating method to form a coating film; (b) supplying a solvent for the coating solution to a projection of the coating film formed at a front surface peripheral edge of the substrate at (a); and (c) rotating the substrate in a state where the supply of the solvent is stopped, to move a top of the projection to an outside in a radial direction of the substrate. (b) and (c) are repeatedly performed. The projection is a buildup of the coating solution protruding from the coating film.
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