Maskless photolithography devices, methods, and systems

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United States of America Patent

PATENT NO 11567411
SERIAL NO

17041756

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Abstract

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A device (100) includes a light source (130) and a light guide (110). The light source (130) is configured to emit photoresist-curative electromagnetic radiation. The light guide (110) is arranged to receive the photoresist-curative electromagnetic radiation from the light source (130) and to guide the received radiation by total internal reflection, the light guide (110) including a pattern of emission points (210) on at least one surface of the light guide (110), the emission points (210) emitting the photoresist-curative electromagnetic radiation out of the light guide (110) by frustration of total internal reflection caused by the emission points (210).

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Patent Owner(s)

Patent OwnerAddress
NANOPATH INC493 LANCASTER ST LEOMINSTER MA 01453

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Donahue, Kevin Harvard, US 28 87

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