Loosely-coupled inspection and metrology system for high-volume production process monitoring

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United States of America Patent

PATENT NO 11562289
APP PUB NO 20200184372A1
SERIAL NO

16287523

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Abstract

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A metrology system is disclosed. In one embodiment, the metrology system includes a controller communicatively coupled to a reference metrology tool and an optical metrology tool, the controller including one or more processors configured to: generate a geometric model for determining a profile of a test HAR structure from metrology data from a reference metrology tool; generate a material model for determining one or more material parameters of a test HAR structure from metrology data from the optical metrology tool; form a composite model from the geometric model and the material model; measure at least one additional test HAR structure with the optical metrology tool; and determine a profile of the at least one additional test HAR structure based on the composite model and metrology data from the optical metrology tool associated with the at least one HAR test structure.

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Patent Owner(s)

Patent OwnerAddress
KLA CORPORATIONONE TECHNOLOGY DRIVE MILPITAS CA 95035

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lee, Lie-Quan Fremont, US 14 159
Madsen, Jonathan Milpitas, US 8 25
Rovira, Pablo Milpitas, US 4 17
Shchegrov, Andrei V Campbell, US 92 2359
Wu, Song Shanghai, CN 107 1349
Xu, Yin Shanghai, CN 35 86

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