Producing method for gold sputtering target and producing method for gold film

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United States of America Patent

PATENT NO 11555238
APP PUB NO 20200299826A1
SERIAL NO

16894552

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Abstract

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A production method for a gold sputtering target includes: producing a gold sputtering target which is made of gold and inevitable impurities and in which an average value of Vickers hardness is 40 or more and 60 or less, an average value of crystal grain size is 15 μm or more and 200 μm or less, and the {110} plane of gold is preferentially oriented to a surface to be sputtered of the gold sputtering target.

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Patent Owner(s)

Patent OwnerAddress
TANAKA KIKINZOKU KOGYO K K7-3 MARUNOUCHI 2-CHOME CHIYODA-KU TOKYO 100-6422

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ishikura, Chiharu Tomioka, JP 5 4
Kato, Tetsuya Tomioka, JP 131 1566
Mizuno, Yohei Tomioka, JP 4 3

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