Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process

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United States of America Patent

PATENT NO 11548844
SERIAL NO

16417909

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Abstract

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A negative resist composition comprising a polymer comprising recurring units having at least two acid-eliminatable hydroxyl or alkoxy groups in the molecule is effective for forming a resist pattern having a high resolution and minimal LER while minimizing defects.

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Patent Owner(s)

Patent OwnerAddress
SHIN-ETSU CHEMICAL CO LTD4-1 MARUNOUCHI 1-CHOME CHIYODA-KU TOKYO 100-0005

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Domon, Daisuke Joetsu, JP 54 432
Inoue, Naoya Joetsu, JP 92 1619
Kotake, Masaaki Joetsu, JP 44 87
Masunaga, Keiichi Joetsu, JP 92 614
Sagehashi, Masayoshi Joetsu, JP 84 530
Watanabe, Satoshi Joetsu, JP 523 4776

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