Extractor piping on outermost sidewall of immersion hood apparatus
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United States of America Patent
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-
Jan 3, 2023
Grant Date -
Dec 22, 2022
app pub date -
Jun 16, 2021
filing date -
Jun 16, 2021
priority date (Note) -
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status (Latency Note)
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Abstract
In some embodiments, the present disclosure relates to a process tool that includes a lithography apparatus arranged over a wafer chuck and an immersion hood apparatus laterally around the lithography apparatus. The lithography apparatus includes a photomask arranged between a light source and a lens. The immersion hood apparatus comprises input piping, output piping, and extractor piping. The input piping is arranged on a lower surface of the immersion hood apparatus and configured to distribute a liquid between the lens and the wafer chuck. The output piping is arranged on the lower surface of the immersion hood apparatus and configured to contain the liquid arranged between the lens and the wafer chuck. The extractor piping is arranged on an outer sidewall of the immersion hood apparatus and configured to remove any liquid above the wafer chuck that is outside of the immersion hood apparatus.
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