Tunable illuminator for lithography systems

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11543753
APP PUB NO 20210132504A1
SERIAL NO

16886509

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Abstract

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In one example, an apparatus includes an extreme ultraviolet illumination source and an illuminator. The extreme ultraviolet illumination source is arranged to generate a beam of extreme ultraviolet illumination to pattern a resist layer on a substrate. The illuminator is arranged to direct the beam of extreme ultraviolet illumination onto a surface of a photomask. In one example, the illuminator includes a field facet mirror and a pupil facet mirror. The field facet mirror includes a first plurality of facets arranged to split the beam of extreme ultraviolet illumination into a plurality of light channels. The pupil facet mirror includes a second plurality of facets arranged to direct the plurality of light channels onto the surface of the photomask. The distribution of the second plurality of facets is denser at a periphery of the pupil facet mirror than at a center of the pupil facet mirror.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Shih-Ming Hsinchu County, TW 192 1880
Hsieh, Ken-Hsien Taipei, TW 113 1847
Lin, Hua-Tai Hsinchu, TW 72 815
Lo, Wen Taipei, TW 11 9
Su, Wei-Shuo Hsinchu, TW 15 26

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