Mask blank, transfer mask, and method for manufacturing semiconductor device

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11543744
APP PUB NO 20210373432A1
SERIAL NO

17397642

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A mask blank including a light shielding film pattern having high ArF light fastness.

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Patent Owner(s)

Patent OwnerAddress
HOYA CORPORATIONTOKYO 160-8347

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Shishido, Hiroaki Tokyo, JP 102 766

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Patent Citation Ranking

  • 1 Citation Count
  • G03F Class
  • 84.00 % this patent is cited more than
  • 2 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges2136404301 - 1011 - 20010020030040050060070080090010001100120013001400150016001700180019002000210022002300

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