RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus
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United States of America Patent
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Dec 20, 2022
Grant Date -
Mar 25, 2021
app pub date -
Dec 7, 2020
filing date -
Jul 20, 2007
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Abstract
In large area plasma processing systems, process gases may be introduced to the chamber via the showerhead assembly which may be driven as an RF electrode. The gas feed tube, which is grounded, is electrically isolated from the showerhead. The gas feed tube may provide not only process gases, but also cleaning gases from a remote plasma source to the process chamber. The inside of the gas feed tube may remain at either a low RF field or a zero RF field to avoid premature gas breakdown within the gas feed tube that may lead to parasitic plasma formation between the gas source and the showerhead. By feeding the gas through an RF choke, the RF field and the processing gas may be introduced to the processing chamber through a common location and thus simplify the chamber design.
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