Plasma device, plasma generation method

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United States of America Patent

PATENT NO 11523490
SERIAL NO

16970561

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Abstract

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The object of the present disclosure is to efficiently generate plasma. In the plasma device of the present disclosure, a dielectric barrier discharger and an arc discharger are included, but the arc discharger is provided downstream from the dielectric barrier discharger in a discharge space where a gas for generating plasma is supplied. Dielectric barrier discharge occurs at the dielectric barrier discharger, and arch discharge occurs at the arc discharger. As a result of the gas for generating plasma being activated in the dielectric barrier discharge, the aforementioned gas can be adequately converted to plasma in the arc discharger.

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Patent Owner(s)

Patent OwnerAddress
FUJI CORPORATIONCHIRYU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jindo, Takahiro Anjo, JP 26 66

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