System and method for predicting stochastic-aware process window and yield and their use for process monitoring and control

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United States of America Patent

PATENT NO 11521825
APP PUB NO 20210225609A1
SERIAL NO

17200419

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Abstract

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In one embodiment, a method includes generating a model trained to predict a low-probability stochastic defect, using the model to predict the low-probability stochastic defect, determining a process window based on the low-probability stochastic defect, and controlling, based on the process window, a lithography tool to manufacture a device.

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Patent Owner(s)

Patent OwnerAddress
FRACTILIA LLCAUSTIN TX

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mack, Chris Austin, US 29 350

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