Method of determining control parameters of a device manufacturing process
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United States of America Patent
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Nov 29, 2022
Grant Date -
May 20, 2021
app pub date -
Aug 22, 2018
filing date -
Sep 27, 2017
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Abstract
A method for determining a metric of a feature on a substrate obtained by a semiconductor manufacturing process involving a lithographic process, the method including: obtaining an image of at least part of the substrate, wherein the image includes at least the feature; determining a contour of the feature from the image; determining a plurality of segments of the contour; determining respective weights for each of the plurality of segments; determining, for each of the segments, an image-related metric; and determining the metric of the feature in dependence on the weights and the calculated image-related metric of each of the segments.
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