Focus ring adjustment assembly of a system for processing workpieces under vacuum

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United States of America Patent

PATENT NO 11508560
APP PUB NO 20200365405A1
SERIAL NO

15930910

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Abstract

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A focus ring adjustment assembly of a system for processing workpieces under vacuum, where the focus ring may include a lower side having a first surface portion and a second surface portion, the first surface portion being vertically above the second surface portion. The adjustment assembly may include a pin configured to selectively contact the first surface portion of the focus ring, and an actuator operable to move the pin along the vertical direction between an extended position and a retracted position. The extended position of the pin may be associated with the distal end of the pin contacting the first surface of the focus ring and the focus ring being accessible for removal by a workpiece handling robot from the vacuum process chamber.

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Patent Owner(s)

Patent OwnerAddress
BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY CO LTDNO 8 BUILDING NO 28 JINGHAI ER RD ECONOMIC AND TECHNICAL DEVELOPMENT ZONE BEJING 100176

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lembesis, Peter J Boulder Creek, US 8 8
Ma, Shawming Sunnyvale, US 70 771
Pakulski, Ryan M Brentwood, US 17 83
Zucker, Martin L Orinda, US 15 1089

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