Method of annealing reflective photomask by using laser
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 22, 2022
Grant Date -
Jul 22, 2021
app pub date -
Jun 25, 2020
filing date -
Jan 22, 2020
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A laser annealing method performed on a reflective photomask may include preparing a reflective photomask including a pattern area and a border area surrounding the pattern area and irradiating a laser beam onto the border area of the reflective photomask. The irradiating of the laser beam may include split-irradiating a plurality of laser beam spots onto the border area. Each of the plurality of laser beam spots may be shaped using a beam shaper. The beam shaper may include a blind area, a transparent area at a center of the blind area, and a semitransparent area between the blind area and the transparent area. Each of the plurality of laser beam spots may include a center portion passing through the transparent area and having a uniform energy profile and an edge portion passing through the semitransparent area and having an inclined energy profile.
First Claim
Other Claims data not available
Family
International Classification(s)
- 2020 Application Filing Year
- H01L Class
- 29783 Applications Filed
- 21134 Patents Issued To-Date
- 70.96 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 2 Citation Count
- H01L Class
- 65.20 % this patent is cited more than
- 3 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 3.5 Year Payment | $1600.00 | $800.00 | $400.00 | May 22, 2026 |
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | May 22, 2030 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | May 22, 2034 |
