Method and apparatus for monitoring secondary power device, and electronic system including the apparatus
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United States of America Patent
Stats
-
Nov 22, 2022
Grant Date -
N/A
app pub date -
Dec 29, 2020
filing date -
Aug 23, 2018
priority date (Note) -
In Force
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Abstract
A method and apparatus are for monitoring a secondary power device and for accurately checking a state of the secondary power device, and an electronic system includes the apparatus. The method of monitoring a secondary power device includes setting a first reference parameter by using a voltage of at least one capacitor of the secondary power device, setting a second reference parameter by using the voltage of the at least one capacitor and the first reference parameter, and setting a reference level for checking of the state of the secondary power device by using the second reference parameter, wherein the reference level is used in checking of the state of the secondary power device.
First Claim
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Family

- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
SAMSUNG ELECTRONICS CO LTD | 129 SAMSUNG-RO YEONGTONG-GU SUWON-SI GYEONGGI-DO 16677 |
International Classification(s)

- 2020 Application Filing Year
- H02J Class
- 4838 Applications Filed
- 3166 Patents Issued To-Date
- 65.45 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Kil, Min-Sung | Hwaseong-si, KR | 3 | 15 |
# of filed Patents : 3 Total Citations : 15 | |||
Kim, Sang-Hoon | Hwaseong-si, KR | 90 | 934 |
# of filed Patents : 90 Total Citations : 934 | |||
Lim, Hyoung-Taek | Seoul, KR | 6 | 21 |
# of filed Patents : 6 Total Citations : 21 | |||
Nam, Suck-Hyun | Hwaseong-si, KR | 3 | 15 |
# of filed Patents : 3 Total Citations : 15 |
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Patent Citation Ranking
- 0 Citation Count
- H02J Class
- 0 % this patent is cited more than
- 3 Age
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