Photomask with electrostatic discharge protection
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 8, 2022
Grant Date -
Jul 23, 2020
app pub date -
Mar 4, 2019
filing date -
Jan 17, 2019
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The present invention provides a photomask including a substrate, a circuit pattern on the substrate, an electrostatic discharge (ESD) ring on the substrate and an ESD line on the substrate. The ESD structure surrounds the circuit pattern. The ESD line extends between an edge of the substrate and the ESD structure, in which the ESD line includes an edge portion extending beyond an end of an edge of the ESD structure, and the edge portion of the ESD line includes at least one comb-shaped structure.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully