Silicon hydrazido precursor compounds
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United States of America Patent
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Nov 8, 2022
Grant Date -
Sep 30, 2021
app pub date -
Mar 31, 2020
filing date -
Mar 31, 2020
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Abstract
Provided are certain silicon precursor compounds which are useful in the formation of silicon-containing films in the manufacture of semiconductor devices, and more specifically to compositions and methods for forming such silicon-containing films, such as films comprising silicon, silicon nitride, silicon oxynitride, silicon dioxide, a carbon-doped silicon nitride, or a carbon-doped silicon oxynitride film.
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