System of electron irradiation

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United States of America Patent

PATENT NO 11483919
APP PUB NO 20200314995A1
SERIAL NO

16667909

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Abstract

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A system of electron irradiation includes an electron accelerator and an electron beam focusing device. The electron accelerator emits and accelerates a beam of electrons. The electron beam focusing device is located at a rear end of the electron irradiation and includes a beam restraining rail and 2n+1 sets of magnetic poles. The beam restraining rail forms a beam restraining channel through which the beam of electrons are to pass. The 2n+1 sets of magnetic poles are installed on the beam restraining rail and distributed at different locations of the beam restraining channel. An nth set of magnetic poles thereof are arranged for performing, on the beam of electrons, focusing in a first direction. An (n+1)th set of magnetic poles thereof are arranged for performing, on the beam of electrons, focusing in a second direction. The second direction is perpendicular to the first direction. The n is a positive integer.

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Patent Owner(s)

Patent OwnerAddress
HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY430074 HUBEI PROVINCE WUHAN CITY HONGSHAN DISTRICT LUOYU ROAD NO 1037 WUHAN CITY HUBEI PROVINCE 430074

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fan, Mingwu Wuhan, CN 3 1
Huang, Jiang Wuhan, CN 33 1438
Xiong, Yongqian Wuhan, CN 2 1
Yang, Jun Wuhan, CN 792 8454
Yu, Tiaoqin Wuhan, CN 3 1
Zhang, Lige Wuhan, CN 2 1
Zuo, Chen Wuhan, CN 13 12

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