Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

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United States of America Patent

PATENT NO 11467489
APP PUB NO 20200201177A1
SERIAL NO

16805922

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Abstract

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An actinic ray-sensitive or radiation-sensitive resin composition contains a compound that generates an acid upon irradiation with actinic rays or radiation and a resin whose polarity increases by the action of an acid, in which the compound is represented by a specific General Formula (X).

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM CORPORATION26-30 NISHIAZABU 2-CHOME MINATO-KU TOKYO 1068620 ?1068620

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kawashima, Takashi Haibara-gun, JP 165 1524
Tsuchimura, Tomotaka Haibara-gun, JP 104 647
Yagi, Kazunari Haibara-gun, JP 40 393

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