Three-dimensional array architecture for resistive change element arrays and methods for making same
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 4, 2022
Grant Date -
N/A
app pub date -
Jun 22, 2020
filing date -
Jun 22, 2020
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method to fabricate a resistive change element array may include depositing a resistive change material over a substrate and forming a first insulating material over the resistive change material. The method may also include etching a trench in the resistive change material and the first insulating material and forming a cavity in a sidewall of the trench by recessing the resistive change material. The method may further include flowing a conductive material in the cavity and depositing a second insulating material in the trench.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully