Electron diffraction holography

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United States of America Patent

PATENT NO 11460419
APP PUB NO 20210302333A1
SERIAL NO

16835129

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Abstract

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Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.

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Patent Owner(s)

Patent OwnerAddress
FEI COMPANY5350 NE DAWSON CREEK DRIVE HILLSBORO OR 97124

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Deng, Yuchen Eindhoven, NL 17 24
Henstra, Alexander Eindhoven, NL 57 344
Kohr, Holger Eindhoven, NL 13 12

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