Influencing a focal spot
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United States of America Patent
Stats
-
Sep 27, 2022
Grant Date -
N/A
app pub date -
May 26, 2021
filing date -
Jun 3, 2020
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method is for spatially influencing a focal spot of an X-ray source that generates X-ray radiation, to an associated X-ray source, to an associated system and to an associated computer program product. The method according to at least one embodiment includes: producing a focal spot on an anode by way of an electron emitter including a plurality of emitter segments, individually controllable to emit electrons; determining at least one actual value of a spatial extent and/or of a position of the produced focal spot; comparing the at least one actual value with a specified reference value of the focal spot; and controlling the emitter segments based upon the comparison of the at least one actual value and the reference value such that the at least one actual value converges toward the reference value, thereby spatially influencing the focal spot of the X-ray source that generates X-ray radiation.
First Claim
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International Classification(s)
- 2021 Application Filing Year
- H05G Class
- 149 Applications Filed
- 91 Patents Issued To-Date
- 61.08 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- H05G Class
- 0 % this patent is cited more than
- 3 Age
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