EUV chamber apparatus, extreme ultraviolet light generation system, and electronic device manufacturing method

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United States of America Patent

PATENT NO 11452196
APP PUB NO 20210029811A1
SERIAL NO

16894504

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Abstract

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An EUV chamber apparatus includes: a chamber; a target generation unit configured to output a target toward a predetermined region inside the chamber; a gas nozzle through which gas is supplied into the chamber; and a shroud including a first flow path through which a first cooling medium circulates and surrounding at least part of the trajectory of the target inside the chamber.

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Patent Owner(s)

Patent OwnerAddress
GIGAPHOTON INCTOCHIGI COUNTY JAPAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hoshino, Yusuke Oyama, JP 7 12
Kouge, Kouichiro Oyama, JP 3 1
Nishisaka, Toshihiro Oyama, JP 35 276
Okada, Takashi Oyama, JP 461 5155

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