Plasma-assisted atomic layer epitaxy of cubic and hexagonal InN films and its alloys with AIN at low temperatures

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United States of America Patent

PATENT NO 11443942
APP PUB NO 20180040472A1
SERIAL NO

15698344

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Described herein is a method for growing indium nitride (InN) materials by growing hexagonal and/or cubic InN using a pulsed growth method at a temperature lower than 300° C. Also described is a material comprising InN in a face-centered cubic lattice crystalline structure having an NaCl type phase.

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THE GOVERNMENT OF THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVYARLINGTON VA 22203

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Eddy,, Jr Charles R Columbia, US 37 267
Mahadik, Nadeemullah A Springfield, US 7 7
Mehl, Michael J Davidsonville, US 5 3
Nepal, Neeraj Woodbridge, US 9 20
Qadri, Syed B Fairfax Station, US 42 255

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