Chemical liquid preparation method, chemical liquid preparation device, and substrate processing device

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United States of America Patent

PATENT NO 11439967
APP PUB NO 20190091640A1
SERIAL NO

16114253

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Abstract

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A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contains oxygen gas and the inert-gas-containing gas which contains an inert gas to a chemical liquid, wherein in the gas dissolving process, a dissolved oxygen concentration in the chemical liquid is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a mixing ratio corresponding to a predetermined target dissolved oxygen concentration.

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Patent Owner(s)

Patent OwnerAddress
SCREEN HOLDINGS CO LTDJAPAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujita, Kazuhiro Kyoto, JP 171 2454
Fukui, Katsuhiro Kyoto, JP 4 1
Hayashi, Takatoshi Kyoto, JP 9 26
Izuta, Takashi Kyoto, JP 13 92
Kobayashi, Kenji Kyoto, JP 513 9925
Miura, Atsuyasu Kyoto, JP 16 87
Negoro, Sei Kyoto, JP 24 74
Nishide, Hajime Kyoto, JP 5 1
Okamoto, Koichi Kyoto, JP 45 514
Tsujikawa, Hiroki Kyoto, JP 14 104

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