Substrate processing method

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United States of America Patent

PATENT NO 11437229
APP PUB NO 20210066071A1
SERIAL NO

16960106

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Abstract

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A substrate processing method and a substrate processing apparatus are provided, which solve problems of pattern collapse and particles. The substrate processing method includes: a surface modification step of modifying a surface of a substrate having an oxide thereon to improve or reduce roughness of the surface; a surface cleaning step of supplying a treatment liquid to the modified surface of the substrate to clean the surface of the substrate with the treatment liquid; and a hydrophobization step of supplying a hydrophobizing agent to the cleaned surface of the substrate to hydrophobize the surface of the substrate.

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Patent Owner(s)

Patent OwnerAddress
SCREEN HOLDINGS CO LTDKYOTO-SHI KYOTO 602-8585

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujii, Sadamu Kyoto, JP 8 8
Hinode, Taiki Kyoto, JP 23 120
Kobayashi, Kenji Kyoto, JP 513 9925
Then, Pohling Kyoto, JP 1 0

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