Photomask and method of fabricating a photomask

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United States of America Patent

PATENT NO 11435660
APP PUB NO 20190155140A1
SERIAL NO

15967159

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Abstract

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A method of fabricating a photomask includes selectively exposing portions of a photomask blank to radiation to change an optical property of the portions of the photomask blank exposed to the radiation, thereby forming a pattern of exposed portions of the photomask blank and unexposed portions of the photomask blank. The pattern corresponds to a pattern of semiconductor device features.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Chia-Jen Hsinchu County, TW 98 1413
Ho, Yen-Cheng Taichung, TW 8 3
Lee, Hsin-Chang Hsinchu County, TW 203 1090
Lin, Chih-Cheng Kaohsiung, TW 79 292
Lin, Ping-Hsun New Taipei, TW 33 21

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