Cleaning method of semiconductor manufacturing device

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United States of America Patent

PATENT NO 11434565
APP PUB NO 20190112705A1
SERIAL NO

16091202

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Abstract

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This invention provides a cleaning method that uses a cleaning gas composition for a semiconductor manufacturing device, including a monofluorohalogen compound represented by XF (in which X is Cl, Br or I) as the main component, and provides a method for removing unwanted film, such as a Si-containing deposit, attached to the interior of the processing room or processing vessel after a processing operation without damaging the interior of the processing room or processing vessel using such monofluorohalogen compound.

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Patent Owner(s)

Patent OwnerAddress
KANTO DENKA KOGYO CO LTD2-105 KANDA-AWAJICHO CHIYODA-KU TOKYO 101-0063

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kato, Korehito Shibukawa, JP 15 15
Takahashi, Yoshinao Tokyo, JP 13 15

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