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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
SHIN-ETSU CHEMICAL CO LTD	TOKYO TOKYO METROPOLIS

International Classification(s)

• C07C:ACYCLIC OR CARBOCYCLIC COMPOUNDS
• G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

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• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Domon, Daisuke	Joetsu, JP	54	432
Inoue, Naoya	Joetsu, JP	92	1619
Kotake, Masaaki	Joetsu, JP	44	87
Masunaga, Keiichi	Joetsu, JP	92	614
Ohashi, Masaki	Joetsu, JP	190	2040

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date
3.5 Year Payment	$1600.00	$800.00	$400.00	Feb 28, 2026
7.5 Year Payment	$3600.00	$1800.00	$900.00	Feb 28, 2030
11.5 Year Payment	$7400.00	$3700.00	$1850.00	Feb 28, 2034

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge - 3.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 7.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
August 30, 2022	US,11429023,B2   US11429023B2	GRANTED PATENT AS SECOND PUBLICATION
April 30, 2020	US,20200133121,A1   US20200133121A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent Application No: 11429023

Onium salt, negative resist composition, and resist pattern forming process

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