Method for producing a nanocrystalline, gas-sensitive layer structure

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United States of America Patent

PATENT NO 11414319
APP PUB NO 20210363004A1
SERIAL NO

16613939

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Abstract

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A method for producing a nanocrystalline, gas-sensitive layer structure. The method for producing a nanocrystalline, gas-sensitive layer structure on a substrate comprises the steps: depositing a base layer made of a base material; depositing a doping layer made of a doping material; repeating the preceding steps; and performing a tempering step, whereby a gas-sensitive, nanocrystalline layer structure is produced.

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Patent Owner(s)

Patent OwnerAddress
ROBERT BOSCH GMBH70442 STUTTGART

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Krauss, Andreas Tuebingen, DE 62 337
Preiss, Elisabeth Rapperswil, CH 2 2

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