Sputtering method and sputtering apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11404255
APP PUB NO 20210082675A1
SERIAL NO

17015170

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Abstract

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A sputtering method including: performing a pre-sputtering by emitting sputter particles from a target provided in a sputtering apparatus in a state where the target is shielded by a shielding portion of a shutter provided closed to the target to be capable of opening/closing the target; and, after the pre-sputtering, performing a main-sputtering by emitting the sputter particles from the target in a state where an opening of the shutter is aligned with the target thereby depositing the sputter particles on a substrate. When the pre-sputtering and the main-sputtering are repeatedly performed, a shutter position is changed during the pre-sputtering so as to change a position of the shielding portion aligned with the target.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 1076325 ?1076325

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujihara, Tomoyuki Yamanashi, JP 1 0
Gomi, Atsushi Yamanashi, JP 71 3146
Hatano, Tatsuo Yamanashi, JP 76 1649
Motomura, Yuuki Yamanashi, JP 2 0
Ono, Kazunaga Yamanashi, JP 9 20
Otagiri, Yasuhiro Yamanashi, JP 1 0

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