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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY	222 WANGSHIPRI-RO SEONGDONG-GU SEOUL 04763

International Classification(s)

• H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
• G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

• [Classification Symbol]

• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Ahn, Jinho	Seoul, KR	8	17
Hong, Seongchul	Seoul, KR	13	26
Kim, Jung Hwan	Seoul, KR	112	856

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date
3.5 Year Payment	$1600.00	$800.00	$400.00	Feb 2, 2026
7.5 Year Payment	$3600.00	$1800.00	$900.00	Feb 2, 2030
11.5 Year Payment	$7400.00	$3700.00	$1850.00	Feb 2, 2034

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge - 3.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 7.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
August 02, 2022	US,11402746,B2   US11402746B2	GRANTED PATENT AS SECOND PUBLICATION
July 04, 2019	US,20190204732,A1   US20190204732A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent Application No: 11402746

Mask protective module, pellicle having the same, and lithography apparatus having the same

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