Processing liquid generation method, processing liquid generation mechanism, semiconductor manufacturing apparatus, and semiconductor manufacturing method
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United States of America Patent
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Jul 26, 2022
Grant Date -
Mar 25, 2021
app pub date -
May 28, 2020
filing date -
Sep 20, 2019
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Abstract
A droplet dispersion mechanism performs a first droplet generation process of supplying gas to a chemical liquid, and dispersing the chemical liquid into droplets to acquire chemical liquid droplets. A droplet dispersion mechanism performs a second droplet generation process of supplying gas to a chemical liquid, and dispersing the chemical liquid into droplets to acquire chemical liquid droplets. A droplet mixing mechanism performs a droplet mixing process of mixing the chemical liquid droplets and the chemical liquid droplets to acquire a processing liquid in a form of droplets. A discharge nozzle performs a discharge process of externally discharging the processing liquid received from the droplet mixing mechanism.
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