Phase shift mask and electronic component manufacturing method

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United States of America Patent

PATENT NO 11385537
APP PUB NO 20210356856A1
SERIAL NO

16343756

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Abstract

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A phase shift mask includes a transparent substrate and light-shielding portions. The light-shielding portions include a first light-shielding portion, and over one side of it, a first compensating light-shielding portion, which has a first distance to the first light-shielding portion and a first width smaller than a resolution of an exposing machine utilized for an exposure process using the phase shift mask. The light-shielding portions can further include a second compensating light-shielding portion, having a second distance to another side of the first light-shielding portion and a second width smaller than the resolution of the exposing machine. The first distance and the second distance respectively allow the first and the second compensating light-shielding portion to reduce an exposure at a region corresponding to two sides of the first light-shielding portion during the exposure process. A method manufacturing an electronic component utilizing the phase shift mask is also provided.

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Patent Owner(s)

Patent OwnerAddress
BOE TECHNOLOGY GROUP CO LTD100015 NO 10 JIUXIANQIAO ROAD BEIJING CHAOYANG DISTRICT BEIJING CITY BEIJING CITY 100015
BEIJING BOE DISPLAY TECHNOLOGY CO LTDNO 118 JINGHAIYILU BDA BEIJING 100176

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Guo, Huibin Beijing, CN 52 98
Li, Xiaolong Beijing, CN 281 1156
Liu, Mingxuan Beijing, CN 32 37
Song, Yongzhi Beijing, CN 60 62
Wu, Zumou Beijing, CN 8 0
Xu, Wenqing Beijing, CN 34 33
Zhang, Xiaoxiang Beijing, CN 54 189

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