Pupil facet mirror, illumination optics and optical system for a projection lithography system

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United States of America Patent

PATENT NO 11378887
APP PUB NO 20210263420A1
SERIAL NO

17315885

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Abstract

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In an optical system for a projection exposure apparatus, the angle space of the illumination radiation of the projection optical unit at the reticle is twice as large in a first direction as the angle space of the illuminating radiation of the illuminating optical unit.

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Patent Owner(s)

Patent OwnerAddress
CARL ZEISS SMT GMBHGERMANY COHEN OBERKOCHEN BADEN-WURTTEMBERG

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Deguenther, Markus Florstadt, DE 127 1347

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